Ultra high definition OLED mask

Shadow Mask

Ultra high definition OLED mask

Shadow Mask

Ultra high definition OLED mask

Shadow Mask

Fine Glass Mask

Next generation shadow masks

Shadow mask lithography is used in a variety of microsystem applications to realize a cost effective, structured thin film deposition. Especially in the field of OLED displays and sensors for point-of-care diagnostics shadow masks are considered to be the mainstream technology. Fine Glass Masks are a superior technology to the Fine Metal Mask used today.

Fine Metal Mask

Today's shadow masks are mainly made of metal. Fine Metal Mask are characterized by a number of disadvantages.

  • Limited resolution
  • Warpage
  • Undercut profile due to the manufacturing process
  • Unfavourable thermal behaviour

Fine Glass Mask

Using our unique LIDE technology, Fine Glass Mask with superior properties can be produced.

  • Ultra high density masks with sharp features
  • Formation of wrinkles impossible
  • Reduced shadowing effect
  • Thermal expansion identical to typical substrates such as glass and silicon
  • Glass is chemically resistant
    Cleaning with aggressive chemistry becomes possible

Specifications of Fine Glass Mask

Specifications

  • Glass thickness: 0.05 to 1 mm
  • Typical dimension: 200 mm Wafer
  • Smallest (circular) feature size: 2 µm
    All other features are formed from these
  • Typical angle of clearance: 30°

 

 

Pricing

LIDE is a high throughput technology which allows us to offer high quality glass substrates at an appealing price point. Let us convince you.